¡í  "Absorption of D(g) atoms by ultrathin Mg films and Pd-catalyzed decomposition of MgD2"

           Tae Seung Kim, Jun Woo Song, Seung Jun Lee, Jihwa Lee*, Journal of Industrial and Engineering Chemistry, 15, (2009) -> Accepted

 

   ¡í  "Interaction of D with Ti-Adsorbed Polyaniline and Implication for Hydrogen Storage"

          Tae Seung Kim, Kyung Jun Kim, Sam K. Jo,and Jihwa Lee, J. Phys.Chem. B, 112(51), 16431 (2008)

 

   ¡í  "Threshold behavior in kinetic electron emission from oxide insulators"

          Han Kook Kim, Tae Seung Kim, Jihwa Lee, and Sam K,Jo, Phys.Rev.B, 76, 165434 (2007)

        

   ¡í  "Angular distributions of H-induced HD and D2 desorptions from the Si(100) surfaces"

          S. Inanaga, T. Kiyonaga, F. Rahman, F. Khanom, A. Namiki and J. Lee, J. Chem. Phys. 124, 54715 (2006)

 

   ¡í  "Secondary electron ejection from the MgO protection layer in AC plasma display panels for low-energy noble ions"

          S. K. Lee, J. H. Kim, J. Lee and K. -W. Whang, Thin Solid Films 435, 69 (2003). 

    

   ¡í  "P-59: Secondary Electron Emission from MgO Thin Films for Low-Energy Noble Gases by Pulsed-Ion Beam Technique"

          S. K. Lee,  K. -W. Whang, J. H. Kim and J. Lee, SID Symposium Digest 33, 424 (2002).

 

   ¡í  "Effect of post-treatment of MgO on the discharge characteristics of an alternating current plasma display panel"

          J. K. Kim, K. S. Moon, K. W. Whang, and J. Lee, J. Vac. Sci. Technol. B 19(3), 687 (2001).

    

   ¡í  "Kinetic study on the hydrogen atom-induced abstraction and associative desorption from the Si(100) surface at 573 K"

          S. Shimokawa, A. Namiki, T. Ando, Y. Sato, and J. Lee, J. Chem. Phys. 122, 356 (2000).

 

    ¡í  "Mechanism and cross sections for HD and CH4-xDx(x=1-4) formation in D(g) +CH3/Cu(111) reaction at 100 K"

          J.-Y. Kim and J. Lee, J. Chem. Phys.112, 1 (2000).

 

    ¡í  "Surfactant-assisted MOCVD of (111)-oriented copper films with excellent surface smoothness"

          E.S. Hwang and J. Lee, Electrochem. Solid StateLett. 3, 138 (2000).

    

    ¡í  "Photochemistry of N2O on Si(100) : Surface photo-oxidation

          H. Kato, J. Lee, K. Sawabe, and Y. Matsumoto, Chem. Phys. Lett. 445, 209 (2000).

 

    ¡í  "Kinetics, mechanism, and dynamics of the gas-phase H(D) atom reaction with adsorbed  D(H) atom on Pt(111)"

          J.-Y. Kim and J. Lee, J. Chem.Phys. 113, 2856 (2000).

 

    ¡í  "Surfactant-catalyzed chemical vapor deposition of copper thin films"

          E.S. Hwang and J. Lee, Materials Chem. 12(8), 2076 (2000).

 

    ¡í  "Direct absorption of gas-phase atomic hydrogen by Si(100) : A narrow temperature window"

          S.K. Jo, J.H. Kang, X. Yan, J. M. White, J. G. Ekerdt, J. W. Keto, and J. Lee, Phys. Rev. Lett. 85(9), 2144 (2000).

 

    ¡í  "SIze distribution of quantum-scale GaAs islands grown by Ga droplet induce chemical beam epitaxy"

          Jeong-Rae Ro, Sung -Bock Kim, Kyoungwan Park, and Jihwa Lee, J. Vac. Sci. Technol. B 18, 1507 (2000).

 

    ¡í  "Ga-droplet-induced formation of GaAs nano-islands by chemical beam epitaxy"

          Jeong-Rae Ro, Sung -Bock Kim, Kyoungwan Park, El-Hang Lee and Jihwa Lee, Journal of Crystal Growth, 201-202, 1198 (1999).

 

    ¡í  "Spatial and kinetic separation of Eley-Rideal plus primary hot atom and secondary hot atom mechanisms in H atom abstraction of adsorbed D atoms on Pt(111)"

          J.-Y. Kim and J. Lee, Phys. Rev. Lett. 82, 1325 (1999).

 

    ¡í  "Molecular hydrogen evolution from bulk crystalline silicon pretreated with thermal hydrogen atoms"

          J. H. Kang, S. K. Jo, J. Lee, B. Gong, D. Lim, J. M. White, and J. G. Ekerdt, Phys. Rev. B 59, 13170 (1999).

 

    ¡í  "Electron ejection from MgO thin films by low energy noble gas ions:Energy dependence and initial instability of the secondary electron emission coefficient"

          K. S. Moon, J. Lee, and K. W. Whang, J. Appl. Phys. 86 ,4049 (1999).

  

    ¡í  "Low temperature CO oxidation triggered by the gas-phase D atom incident on Pt(111) covered with O2 and CO"

          J.-Y. Kim and J. Lee, J. Chem.Phys. 109, 869 (1998).

 

    ¡í  "Correlation between the early stage of copper metal organic chemical vapor deposition and the material properties of thin film"

          E. S. Hwang and J. Lee, J. Vac. Sci. Tech. B16, 3015 (1998).